Strengthening ultrathin Si3N4 membranes by compressive surface stress
نویسندگان
چکیده
In this work, the effect of compressive surface stress on thin film membrane fracture was studied by bulge test. order to create membranes with residual at surface, low-pressure chemical vapor deposition (LPCVD) Si3N4 were coated a 1−8 nm SiNx adlayer or subjected Ar-ion bombardment. Fracture strength analysis, done using finite element method and Weibull distribution, microscope inspection failed showed that pressure limit is determined intrinsic mode, caused high induced edge near top surface. By creating maximum applied reduced increased from 17.3 GPa 18.3 GPa. As result, 50 % increase in limit, 5 kPa/nm 7.5 kPa/nm.
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ژورنال
عنوان ژورنال: Sensors and Actuators A-physical
سال: 2021
ISSN: ['0924-4247', '1873-3069']
DOI: https://doi.org/10.1016/j.sna.2020.112456